Purdue News Photos
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Vistec Semiconductor Systems technicians John Cunanan, (standing) a field simulation engineer, and Paul Whitwood, a final test engineer, conduct tests on a Leica Vector Beam photolithography machine in the cleanroom at the Birck Nanotechnology Center's Scifres Nanofabrication Laboratory.
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John Weaver, facility manager at the Birck Nanotechnology Center, works at an optical pattern generator in the Scifres Nanofabrication Laboratory. The instrument, which was donated to Purdue by Raytheon Co., will allow researchers at the Birck cleanroom to add thin films with atomic layer precision on computer chips. The instrument rests on a 4,000-pound granite table in a specially lit lab to protect photo-sensitive images on the silicon chips.
(Purdue News Service photo/David Umberger)
The story accompanying these photographs can be seen by clicking this link to Adams.cleanroom
For more information about photographs, send e-mail to:
David Umberger
Associate Director
Purdue News Service
umberger@purdue.edu
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